Air Liquide (AL) recently announced that it will build a new industrial gas production facility in the United States to supply the new fab of one of the world’s leading semiconductor manufacturers. AL will invest over 250 million dollars in this state-of-the art production unit.

AL will build, own and operate a new industrial gas production facility in Idaho which will produce large volumes of ultra-pure nitrogen and other gases for Micron Technology, as well as for other customers of the area. The facility is expected to be operational by the end of 2025.

This innovative plant is part of a complete Carrier Gas solution designed by AL for large customers, with an optimized land footprint and total cost of ownership. The new production unit is 5% more power efficient than the previous generation plants. Producing most of the gases onsite will also avoid transporting them by trucks. In addition, the electricity for the facility is targeted to be 100% from renewable sources within the next five years.